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Advantages of Ion Implantation Technology in Crystalline Silicon Solar Cells
Date : 2023-10-31Views : 50
In the production process of crystalline silicon solar cells, ion implantation is a very important process. It can greatly improve the photoelectric conversion rate and achieve lean and effective application. Millennial Solar is a photovoltaic company with numerous equipment for testing cell and module performance. Its FTIR Spectrometer can measure the H content of crystalline silicon solar cells after the ion implantation process to determine whether the passivation effect meets solar cell production standards. Ultimately, the efficiency and performance of solar cells are judged.
The Principle of Ion Implantation Process
Ion implantation is a semiconductor process that uses accelerated ion beams to inject specific elements into the surface of solar cells. The principle of the ion implantation process is to use an accelerator to accelerate the ion beam to high speed, and then guide the ion beam to the surface of the silicon wafer of the solar cell. The ion beam interacts with the surface of the cell, causing the ions to enter the surface layer of the solar cell.